High-speed heating process under vacuum atmosphere and low oxygen concentration atmosphere for metals, wafers, etc.!
The "PH-224 type" is a vacuum hot plate chamber that supports a maximum temperature of 400°C. It is a compact batch furnace type, ideal for small quantities and research and development. It employs a thin heater as the heating source, enabling it to accommodate high-speed temperature profile processes. Additionally, an observation window allows for visibility of the workpiece's condition. The temperature controller, designed specifically for this purpose, can obtain the necessary data for process verification (analog output). It supports air cooling and can reach a maximum temperature of 400°C. ● For more details, please download the catalog or contact us.
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【Features】 ○ Temperature control range: Room temperature to 400℃ ○ Work size: Maximum 200×200mm, chamber height 200mm ○ Heating speed: 100℃/min ○ Pressure range: -100KPa (vacuum) to 0.1MPa (when filled with N2 gas) ● For more details, please download the catalog or contact us.
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For more details, please contact us.
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High-speed heating process under vacuum atmosphere and low oxygen concentration atmosphere for metals, wafers, etc.
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