It is a small batch furnace type, ideal for small quantities and research and development.
The semi-automatic vacuum hot plate chamber "PH-224S-42" is a small batch furnace type, ideal for small quantities and research and development. It uses thin heaters as the heating source, enabling it to accommodate high-speed temperature profile processes. It has the capacity to process three 6-inch wafers or two 8-inch wafers as a wafer heating batch furnace. 【Features】 ○ Maximum temperature: 300°C ○ The temperature controller, being a dedicated type, can obtain necessary data for process verification (analog output) ○ Valve operation: automatic response (programmable according to the recipe) For more details, please contact us or download the catalog.
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【Specifications】 ○ Temperature control range: Room temperature to 300℃ ○ Work size: Maximum 430×270mm ○ Heating speed: 20℃/min ○ Pressure range: -100KPa (vacuum) to 0.02MPa (when filled with N2 gas) ○ Ports for oxygen concentration meter, Pirani vacuum gauge, and temperature monitor ● For more details, please contact us or download the catalog.
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