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  1. Home
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  3. Measurement and Analysis
  4. Microscopes
  5. Electron microscope
  6. Electron microscope-related equipment, electron beam lithography pattern generator SPG-724

Electron microscope-related equipment, electron beam lithography pattern generator SPG-724

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last updated:Feb 07, 2024

サンユー電子
サンユー電子
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It is possible to perform electron beam lithography without compromising the functionality of your SEM.

The pattern generation device SPG-724 for electron beam drawing systems is not intended for semiconductor manufacturing but for research and development of fine circuits, micro-optical components, and nanomachines. The generation and deflection of the electron beam are performed by the SEM itself. By attaching the SPC-724 to the SEM, the observation SEM becomes a drawing device. In addition to the SEM body, the necessary components include a blanking device to turn the beam on and off, a current meter to measure exposure amounts, a pattern generator to send drawing patterns to the blanking device and deflector, and a computer to control these components. 【Features】 ○ Add-on style pattern generation device for EB lithography → Can be attached to various types of SEMs ○ User-friendly design that allows immediate realization of ideas using commercially available CAD ○ No specialized knowledge or skilled techniques required, as with dedicated electron beam drawing machines → Anyone can easily create patterns ○ Achieves batch exposure of wide areas (up to 5mm) For more details, please contact us or download the catalog.

    Electron microscope
SPG-724.png

Electron microscope-related equipment, electron beam lithography pattern generator SPG-724

SPG-724.png
SPG-724.png
  • Related Link - https://www.sanyu-electron.co.jp/products/
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【Specifications】 [Basic Drawing Functions] ○ Drawing Method: Raster Scan / Block Scan ○ Field Size → Raster Scan: 50/100/200/500μm□ → Block Scan: 1mm to 5mm□ ○ Number of Drawing Pixels → Raster Scan: 1000²/2000²/4000²/5000²/10000² dots → Block Scan: 1000² dots ○ Minimum Address Size: 5nm/dat ○ Dose Time: 0.5μsec/dot to 10msec/dot [Control System] ○ PC (OS): Microsoft Windows ○ CAD: CANVAS [Installation Conditions/Dimensions] ○ Power Capacity: Single-phase 100V 50/60Hz 10A ○ Dimensions: Approximately 450W × 600D × 600Hmm ● For more details, please contact us or download the catalog.

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Sanyu Electronics Vacuum Application Equipment / Comprehensive Catalog of Electron Microscope Related Products

Sanyu Electronics Vacuum Application Equipment / Comprehensive Catalog of Electron Microscope Related Products

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サンユー電子

サンユー電子

Testing, Analysis and Measurement

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The management philosophy is to "pioneer the future of research and development with core technology." Our motto is to provide those involved in research and development with what they need at the right time, while enhancing the "expandability of device functions" and offering a "variety of options." Additionally, leveraging our "agility," we strive daily to meet the diverse needs of our customers.

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The related categories of Electron microscope

  • Measurement and Analysis
  • Microscopes
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