サンユー電子 Company Overview

Equipped with three sources of cathodes in a compact tabletop size. It is also possible to produce insulating thin films, oxide, and nitride thin films.

The "SVC-700RFIII" is a compact RF magnetron sputtering device that can be placed on a desk, equipped with three φ2-inch cathodes. It is capable of forming stacked films using three types of targets. It can be expanded with a gas introduction mechanism, allowing for the introduction of up to three types of gases, including argon gas. In addition to metal thin films, it can accommodate the production of various thin films such as insulating films, oxides, and nitrides. 【Features】 ■ Desktop size for research and development ■ Sample size: up to φ2 inches ■ Additional film thickness sensor available *For more details, please refer to the documentation. Feel free to contact us with any inquiries.

You can attach three types of targets simultaneously! It is possible to create a multilayer film.

The multi-compact coater "SVC-700TMSG/Adexcel" is a small film deposition device that generates plasma through direct current discharge using a magnetron cathode in a low vacuum environment. It sputters a metal target attached to the cathode with ions in the plasma, creating a thin film on the surface of the sample. Since three types of targets can be mounted simultaneously, it is possible to select targets in a vacuum and produce multilayer films. 【Features】 - Structure allows for optional installation of film thickness sensors, sample heating units, etc. - Can also be used as a resistance heating vacuum deposition device → Replace the exhaust unit with a resistance heating unit and connect a dedicated power supply. For more details, please contact us.