It is an ion beam sputtering device for DWDM film deposition.
This is an ion beam sputtering device for the optical field. Sputter: 16cm RF Ion Source Assist: 16cm RF Ion Source Target: 2 surfaces, oscillation function Stage: rotation Film thickness control: transmission-type wavelength-variable laser film thickness control Main exhaust: cryopump or TMP + SUPCOLD For more details, please contact us.
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Our company started in 1988 as an overseas export trading company for vacuum thin film manufacturing equipment, and has expanded its operations as a "total planner of vacuum technology" up to the present day. During this time, we have focused on the development of optical thin film materials, as well as the sales of ion beam processes and refrigeration units (Sapcold). Additionally, we have developed and are set to launch the GCIB (Gas Cluster Ion Beam) process equipment, which is expected to be an important technology in the next generation of nano-processing. Starting with glasses and camera lenses, we now see new media continuously emerging in the optical-related industry, including digital cameras, mobile phones, and medical lenses.
