It is an ion beam sputtering (IBS) device that uses an RF ion source and is equipped with a single stage or planetary stage.
We will design the equipment for research and development or mass production according to customer needs. 【Equipment Features】 - Process operating pressure of 10^-2 Pa (around 10^-4 Torr) Capable of high vacuum film deposition - Low contamination - Non-heated film deposition possible - High-density films - Reactive film deposition possible - Ion beam assist can be added - Good control over film thickness and other parameters
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basic information
●For more details, please contact us or download the catalog. 【Device Specifications Overview】 ・Sputtering Ion Source Focus Grid ・Assist Ion Source Defocus Grid ・Single Stage ・Target Holder ・Exhaust System ・Control System 【Options】 ・Planetary Stage ・Film Thickness Measurement Transmission Optical Monitor Quartz Film Thickness Monitor ・Fully Automatic Multi-Layer Thin Film Deposition Software
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Company information
Our company started in 1988 as an overseas export trading company for vacuum thin film manufacturing equipment, and has expanded its operations as a "total planner of vacuum technology" up to the present day. During this time, we have focused on the development of optical thin film materials, as well as the sales of ion beam processes and refrigeration units (Sapcold). Additionally, we have developed and are set to launch the GCIB (Gas Cluster Ion Beam) process equipment, which is expected to be an important technology in the next generation of nano-processing. Starting with glasses and camera lenses, we now see new media continuously emerging in the optical-related industry, including digital cameras, mobile phones, and medical lenses.
