Supports small diameters such as 2 inches! Can be cleaned with 0.5 liters of pure water per sheet!
~ High performance is great. But for those who think it's out of reach ~ MTK's Wet Processing Equipment is a high-performance cleaning device that can be installed in even the smallest spaces, capable of cleaning with minimal chemical solution and pure water. 【Features】 - Extremely low particle count (on the wafer surface) - Low usage of pure water and chemicals * Pure water... 0.5 liters (per wafer), chemicals... 20 liters (per day) - Compact equipment size <Main processing unit> Width 1100mm / Depth 800mm / Height 1900mm <Chemical supply unit> Width 500mm / Depth 800mm / Height 1800mm - Amazingly low price ~ For more details, please download the catalog or contact us ~
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basic information
※□※■Exhibiting at Semicon Japan!!■※□※ This is an opportunity to touch the actual equipment. Please stop by our booth. Dates: December 3 (Wed) - 5 (Fri), 2014 Location: Tokyo Big Sight, East Exhibition Hall and Conference Hall Booth No: 5031
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Applications/Examples of results
Semiconductor wafers (SiC, GaN, silicon, sapphire, etc.), MEMS, various sensors.
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Company information
MTK Corporation proposes high-performance, low-cost cleaning and etching equipment for compound wafers and Si wafers to your company. ● We have received many evaluations for cleaning SiC, LT, LN, GaAs, GaN, and Si wafers. ● We have extensive experience in business with overseas markets, especially China, serving as a bridge for business. ● For cleaning compound semiconductor substrates and wet etching, please leave it to MTK Corporation. We are the Japanese agent for Beijing TanKeBlue and have received many inquiries from companies regarding the sale of SiC wafers and ingots. Additionally, we also handle next-generation semiconductor materials such as GaN substrates. We will respond to your detailed requests with sincerity and dedication.