It is a high-output RF ion source that achieves a wide range and stable discharge.
It enables stable discharge over a wide range and can be used for various applications, from improving adhesion from non-shift films of optical filters to resin substrates. Our unique approach allows for reliable ignition and stable discharge performance. 【Features】 ○ High-output ion source with beam current of 1500mA / beam voltage of 1500V / ion current density of over 100μA/cm² ○ Achieves uniformity of ion current density distribution within ±10% (measured with the 1300 and 1550 devices) at high power → Measurement results from Sapio-1300, limited to specified conditions by Showa Vacuum Co., Ltd. ○ Adoption of an auto-matcher for the neutralizer to ensure reliable ignition performance and stabilization ○ The use of a newly developed collector electrode (patent pending) enables high output with an emission current of 2500mA → Prevents particle generation due to charge-up For more details, please contact us or download the catalog.
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basic information
【RF Ion Source Specifications and Dimensions】 ○ Grid Diameter: Φ180mm, 3-piece configuration, made of molybdenum ○ BEAM v: 100–1500V ○ BEAM i: 100–1500mA ○ ACC v: 100–1000V ○ RF POWER: 1000W ○ GAS FLOW: 30–100sccm 【RF Neutralizer Specifications and Dimensions】 ○ EMISSION: 2500A ○ RF POWER: 200W ○ GAS FLOW: Ar 5–20sccm ○ External Dimensions: Φ80×275H (mm) ● For more details, please contact us or download the catalog.
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Applications/Examples of results
Optical film ●For more details, please contact us or download the catalog.
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Company information
Showa Vacuum Co., Ltd. manufactures and sells vacuum technology application devices (vacuum equipment) such as vacuum deposition devices and sputtering devices, primarily focused on equipment that forms thin films on specific substrates in a vacuum.
