Experimental/Research Mask Aligner "ES410"

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last updated：May 20, 2016

ナノテック

Official site

Complete with all the necessary functions for photolithography at a low cost! Mask aligner.

The experimental and research mask aligner "ES410" is a low-cost mask aligner that possesses sufficient functionality for photolithography. It features a wide range of customization unique to the ES series, allowing you to select various units and options to set up a device that fits your specific needs. Additionally, most units can be added or changed later, accommodating future upgrades. As a fully manual machine, it can be used for various experiments, research, and learning about photolithography. 【Features】 ■ Wide range of customization unique to the ES series ■ Options to select various units and options ■ Can be set up to fit specific purposes ■ Most units can be added or changed later ■ Accommodates future upgrades, among others *For more details, please refer to the catalog or feel free to contact us.

Related Link - http://www.nanotech-inc.co.jp/index.html

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basic information

【Specifications】 ■ Type - 1:1 scale single-sided exposure mask alignment device ■ Exposure Method - 1:1 scale exposure, contact and proximity ■ Applicable Samples - Maximum φ4 inches, thickness within 3mm - Compatible with various sizes by changing the sample stage ■ Fixing Method - Vacuum suction type ■ Applicable Masks - Maximum □5 inches, thickness of 0.06 or 0.09 inches - Compatible with various sizes by changing the mask holder ■ Fixing Method - Vacuum suction type ■ Mask Holder - Hinge opening and closing type (with mechanical lock) ■ Alignment - Mask fixation, wafer XYZ∂ axis stage movement *For more details, please refer to the catalog or feel free to contact us.