You can create an optimal system configuration with a semi-custom setup.
In addition to the general-purpose mask aligner ES20 series, we offer a variety of products including a wafer double-sided exposure type and a back-side observation mask aligner. We also accept custom equipment development and manufacturing tailored to customer specifications for photolithography-related devices and MEMS research and development support equipment.
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basic information
Contact-type equal magnification pattern exposure device. A device that exposes patterns on silicon wafers and other materials using ultraviolet light.
Price information
3.5 million to 9 million yen
Delivery Time
P4
Applications/Examples of results
It is used for the manufacturing and research of various semiconductor products such as sensors, power-related components, LEDs, and communication-related chips.
Company information
For inquiries regarding MEMS micromachine-related development tools, please contact us.
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