Adachi New Industry Co., Ltd. Business Introduction

Interdigitated Electrode (IDE) is an important electrode structure used in various sensing devices such as biosensors, gas sensors, and impedance measurements. At Adachi New Industry, we leverage our long-standing thin film formation technology and fine pattern processing technology to manufacture high-performance interdigitated electrodes using copper (Cu). ◆◆Are you facing any of these issues? - Concerned about the degradation of electrode performance due to copper (Cu) oxidation - Unable to form fine interdigitated patterns - Difficulties with etching, and less expertise in fine processing compared to Au or ITO - Unable to produce chips suitable for electrical migration testing - Poor adhesion to substrates, leading to delamination or cracking (struggling with the design of barrier layers or surface treatments) - Unable to find a processing partner that can produce stable prototypes in small quantities Please check our website for more information.

Diamond, referred to as the "ultimate semiconductor," is expected to contribute to improvements in energy efficiency, innovations in information and communication technology, and even advancements in quantum technology and the medical field due to its unparalleled physical and electrical properties. In recent years, advancements in the synthesis technology of high-quality diamond crystals have made the practical application of devices using diamond, once considered a dream material, increasingly realistic. However, to realize its excellent potential as a device, precise "thin film processing technology" at the nanometer scale is essential. This time, we will introduce the application fields of diamond devices that are progressing toward practical use and the thin film processing technology. 1. Accelerating practical use of diamond devices 2. Essential thin film processing technology for device fabrication 3. Challenges in thin film processing and future prospects For more details, please visit our company website.

We sincerely apologize for the inconvenience, but we would like to inform you about our business hours and shipping schedule during this year's Golden Week as follows: We understand that this may cause some difficulties for our business partners, and we greatly appreciate your understanding and cooperation. ■ Closed Days: April 29, 2025 (Tuesday) and May 3, 2025 (Saturday) to May 6, 2025 (Tuesday) ■ Shipping Resumes: May 7, 2025 (Wednesday) << Request >> We anticipate significant congestion before and after Golden Week, which may disrupt transportation. At Adachi Shin Sangyo Co., Ltd., we are committed to taking the utmost care to minimize any inconvenience. We kindly ask for your understanding and consideration, and to handle your orders with ample lead time. Thank you.

Etching and lift-off are both processes related to photolithography, but they differ in purpose and processing methods. Here, I will explain each process and their differences. Etching Etching is a process that uses the patterned resist created by photolithography as a mask to remove material according to that pattern. By removing unwanted parts, it forms circuits or structures on the substrate surface. 1) Main purpose: To remove unwanted material and engrave a pattern on the surface. 2) Method: Dry etching (such as reactive ion etching): Uses gases that involve chemical reactions to remove material from the substrate surface. This allows for very precise processing.