Formation of localized etching areas! High-precision shape creation through scanning.
The "MS-3030LWE" is a numerically controlled local wet etching device that can create arbitrary shapes by scanning a locally controlled liquid phase etching area with speed control. Since it is a non-contact chemical distortion-free processing method, it is insensitive to disturbances such as vibrations. The processing amount can be accurately controlled with nanometer-order precision based on the etchant's residence time and temperature, allowing for the creation of arbitrary shapes. [Features] - Non-contact processing - Chemical distortion-free processing - Nanometer-order processing precision - Creation of arbitrary shapes through 5-axis NC control *For more details, please refer to the catalog or feel free to contact us.
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【Main Specifications】 ■ Equipment Configuration - Main unit (Cleanroom compatible) - Control panel (Cleanroom compatible) ■ Workpieces: Synthetic quartz, Si, SOL wafers, quartz wafers ■ Main Control Unit: 5-axis NC control ■ Table Scroll - X-axis: 350mm - Y-axis: 350mm - Z-axis: 100mm - a-axis: ±25° - b-axis: 12rpm (max), etc. *For more details, please refer to the catalog or feel free to contact us.
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For more details, please refer to the catalog or feel free to contact us.
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