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  6. Introduction to Silicon Etching Processing Technology

Introduction to Silicon Etching Processing Technology

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last updated:Nov 12, 2020

フォトプレシジョン
フォトプレシジョン
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By selecting the type of crystal orientation, you can choose the type of groove processing!

"Silicon etching" is a processing technology that corrodes the silicon substrate itself to form three-dimensional structures. There are two types of silicon corrosion: one that progresses in a specific direction (anisotropic) and one that progresses in all directions (isotropic). When performing anisotropic etching, single-crystal silicon is used for the substrate, and an etching solution such as KOH aqueous solution is employed. Single-crystal silicon wafers are categorized by crystal direction, and by selecting this, it is possible to choose the type of groove processing. Additionally, isotropic etching can also be performed depending on the type of etching solution used. [Features] - Corrodes the silicon substrate itself to form three-dimensional structures - Allows selection of groove processing types by choosing the type of crystal direction - Isotropic etching is possible depending on the type of etching solution *For more details, please refer to the catalog or feel free to contact us.

    Technology Development
『シリコンエッチング』加工技術紹介.JPG

Introduction to Silicon Etching Processing Technology

『シリコンエッチング』加工技術紹介.JPG
『シリコンエッチング』加工技術紹介.JPG
  • Related Link - http://www.photopre.co.jp/technology/etching_si.ht…

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【Types】 ■V-groove processing ■Corner groove processing ■Isotropic *For more details, please refer to the catalog or feel free to contact us.

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【Applications】 ■Fiber array ■Devices for MEMS (mirrors) ■Microdevices, etc. *For more details, please refer to the catalog or feel free to contact us.

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Introduction to Silicon Etching Processing Technology

Introduction to Silicon Etching Processing Technology

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フォトプレシジョン

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Manufacturing and processing contract

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Photo Precision Co., Ltd. is a company that contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as its core technology. Next-generation industrial core products such as MEMS (Micro Electro Mechanical Systems), biochips, and microchemical chips are formed by the complex application of technologies such as nanotechnology, three-dimensional micromachining, high-density three-dimensional packaging, and three-dimensional photolithography. Photofabrication is deeply involved in all of these technologies and serves as the foundational technology for MEMS development. We strive for continuous technical improvement with the support of our customers, while also introducing advanced equipment as much as possible to meet the diverse needs of our clients.

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