Silicon etching

basic information

Photo Precision Co., Ltd. contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as its core technology. Here is an introduction to "Silicon Etching." A technology that corrodes the silicon substrate itself to form three-dimensional structures. ■□■Features■□■ ■ Utilizing the crystal orientation of silicon, it enables groove processing with flat groove walls (anisotropic etching). V-shaped and rectangular grooves can be formed. ■ Depending on the type of etching solution, rounded edges can be created on the groove walls, allowing for isotropic etching as well. ■□■Types of Processing■□■ ■ V-Groove Processing - Using silicon material with a <100> surface, V-shaped grooves are formed. - The angle of the slope is always the same (54.7°). ■ Rectangular Groove Processing - Using silicon material with a <110> surface, rectangular grooves can be formed. - Due to the crystal structure, the direction of the grooves tilts at 54.7° relative to the side surface. ■ Isotropic - Etching progresses uniformly in all directions. ■ For more details, please download the catalog or contact us.

Price information

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Applications/Examples of results

■□■Applications■□■ ■Fiber array ■Devices for MEMS (mirrors) ■Micro devices, etc.