Lithography Technology: Its 40 Years

The authors who have developed lithography technology introduce its origins, breakthroughs, technologies that have disappeared and their reasons, as well as the latest technologies.

The year 2017 marks 40 years since the mass production of semiconductors began. This stems from GCA's launch of the stepper (g-line NA0.28) in 1977, which transitioned from contact and proximity exposure to reduction projection exposure methods. The advent of the stepper significantly advanced the miniaturization of pattern dimensions and the mass production capabilities of semiconductors. Indeed, 1977 can be considered the starting point of a leap in lithography technology. Therefore, I believe it is meaningful to publish a book reflecting on the 40-year history of lithography technology and contemplating its future prospects at this time. Additionally, many renowned researchers who witnessed the dawn of lithography technology are now of retirement age, and valuable experiences and materials are at risk of being lost. Thus, we invited pioneering experts to discuss the various turning points in lithography technology, how they overcame challenges, the history of material development, and stories of the difficulties faced in those times. I believe that this work not only reflects on history but also inspires young researchers to dream about their research.

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