Introduction to the development materials for the "Robust High Brightness, Long Lifespan, Low Power Consumption Electron Gun."
Development materials for a robust high-brightness, long-lifespan, low-power consumption electron gun!
This document is a development material from PARAM Corporation, which aims to develop a parallel-type electron beam exposure technology using multi-column and multi-beam for direct wafer writing with an electron beam. The company is advancing the development of key technologies such as columns and electron guns. The goal is to achieve low-temperature operation using Schottky emission with new materials and to extend lifespan using a carbon material heating method. [Development Content] ■ Robust high-brightness, long-lifespan, low-power consumption electron gun *For more details, please refer to the catalog or feel free to contact us.
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basic information
[Prototype Experiment] ■Prototype evaluation using various materials *For more details, please refer to the catalog or feel free to contact us.
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For more details, please refer to the catalog or feel free to contact us.
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Company information
PARAM Corporation is a company engaged in the development, manufacturing, and consulting of ultra-fast electron beam drawing technology and essential technologies. Through the development of core technologies such as multi-column technology using permanent magnets, high-brightness uniform irradiation long-life electron guns, and programmable shape-variable beams (PSB), we contribute to the advancement of society through device development and manufacturing.
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