PARAM Product Lineup

PARAM offers the "Electron Beam High-Speed Drawing System." Our proposed product, utilizing the "Multi-Column Multi-Beam Method," generates a PSB through a multi-beam method consisting of a matrix-formed micro aperture and deflection electrodes, enabling exposure via a step-and-shot method. As a result, higher drawing accuracy is expected compared to the continuous stage movement method. 【Features】 <Multi-Column Multi-Beam Method Multi-axis PSB> ■ Achieves 87 multi-columns with a pitch of 26×33mm ■ Throughput depends on the size and pitch of the drawing pattern: 10–16 WPH ■ Clustering can achieve up to 100 WPH ■ Higher drawing accuracy is expected compared to the continuous stage movement method *For more details, please refer to the PDF document or feel free to contact us.

• others

PARAM offers contract development for "electronic circuits for electron beam control." We undertake the design and manufacturing of various control circuit technologies for electron beam scanning, position detection, stabilization, and more. We are also available to discuss beam control methods and adjustment and measurement techniques tailored to various applications. Please feel free to contact us. 【Features】 ■ Development of control software is also possible, not just circuits ■ We can respond to inquiries about beam control methods and adjustment and measurement techniques tailored to your needs *For more details, please refer to the PDF materials or feel free to contact us.

• Other contract services

PARAM offers design, manufacturing, and contracting services for "electron beam columns." We have a wealth of optimized design and manufacturing technologies that can meet various demands, from high currents to micro spots. We also provide consultations on various topics, including multi-column and multi-beam technologies. Please feel free to reach out to us. 【Contracting Process】 1. Inquiry 2. Meeting 3. Design 4. Manufacturing 5. Delivery *For more details, please refer to the PDF materials or feel free to contact us.

• Contract manufacturing

PARAM manufactures and sells "Ozone Supply and Decontamination Equipment for Vacuum Use." The "supply device" can accurately introduce trace amounts of ozone into a vacuum. There is no need to stop the equipment for cleaning. Additionally, the "decontamination device" is compact, has high conductance, and generates minimal particles. For more details, please feel free to contact us. 【Features】 <Ozone Gas Supply Unit for EB Equipment> ■ Generates high-concentration ozone without particle generation and is nitrogen-free ■ Accurately introduces trace amounts of ozone gas into the equipment ■ No need to stop the equipment for cleaning ■ Low noise and can be installed near EB equipment *For more information, please refer to the PDF materials or feel free to contact us.

• Contract manufacturing

PARAM Corporation is a company that develops electron beam technology using a parallel multi-column and multi-beam system for direct wafer writing with electron beams. In the near future, fine processing technology will be required to be below 5nm, and applications, including artificial intelligence chips, are needed in many fields as both development and mass production technologies. Our company will do our utmost to be of service to everyone with various electron beam element technologies and related technologies. 【Business Activities】 ■ Manufacturing and sales of ozone supply and exclusion devices for vacuum ■ Design, manufacturing, and contract development of electron beam columns ■ Contract development of electronic circuits for electron beam control *For more details, please refer to the PDF materials or feel free to contact us.

• Electron beam lithography equipment
• Other electronic parts
• Contract manufacturing

This document is a development material from PARAM Corporation, which aims to develop a parallel-type electron beam exposure technology using multi-column and multi-beam for direct wafer writing with an electron beam. The company is advancing the development of key technologies such as columns and electron guns. The goal is to achieve low-temperature operation using Schottky emission with new materials and to extend lifespan using a carbon material heating method. [Development Content] ■ Robust high-brightness, long-lifespan, low-power consumption electron gun *For more details, please refer to the catalog or feel free to contact us.

• Electron beam lithography equipment
• Other electronic parts