Film-forming reaction technology particularly using "water" among liquids!
The "Mist CVD method" is a technology that uses a liquid "mist" that can be treated like a gas to perform a film-forming reaction (CVD). By using a mist-like raw material solution and a heating section, it is possible to produce oxide semiconductor thin films easily, inexpensively, and safely. This technology is suitable for forming many crystalline oxide films, and by applying it, it can be utilized in various applications and industrial fields such as solar cells, fuel cells, and organic devices. 【Features】 ■ Made from liquids, especially water ■ Raw materials can be supplied to the film-forming chamber in mist form ■ High safety of raw materials ■ No vacuum pump required ■ Large area, low cost, compact size, and high throughput are achievable *For more details, please refer to the catalog or feel free to contact us.
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basic information
【Types of Films】 ■Gallium Oxide ■Iron Oxide ■Chromium Oxide ■Silicon-Aluminum Oxide ■Magnesium Oxide ■Copper-Nickel Oxide ■Titanium Oxide ■Indium Oxide ■Lithium Oxide ■Zinc-Tin Oxide *For more details, please refer to the catalog or feel free to contact us.
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Applications/Examples of results
【Application Examples】 ■ Power devices ■ Substrates for LEDs ■ Semiconductor and magnetic materials ■ Corrosion-resistant films and protective films ■ Insulating films ■ P-type conductive layers of oxide PV ■ Photocatalysts ■ Transparent conductive films for displays ■ Positive and negative electrodes and electrolytes for LIBs *For more details, please refer to the catalog or feel free to contact us.
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Company information
FLOSFIA Inc. is a company that develops the "Power Device Business" and "Film Solution Business" based on mist CVD film formation technology. We are working on commercializing various technologies, including applications such as SiO2 and Al2O3, film formation using three-dimensional objects, porous films, and organic materials as substrates, as well as film formation of not only metal oxides but also metal plating and organic films.