We respond to diverse cleaning needs with high-speed clean technology!
The "Spin Cleaning Device" is a product handled by Shimada Technology Co., Ltd. It adopts an environmentally friendly cleaning method centered on "water and air." It also achieves high-efficiency exhaust through a full-circle exhaust cup structure. Additionally, it realizes high yield with a variety of cleaning tools. Furthermore, we offer handling compatible with wafer-type and rectangular substrates, as well as a wide range of unit lineups that accommodate various sizes. 【Features】 ■ Contributes to energy savings through high performance ■ Achieves high yield with a variety of cleaning tools ■ Matches various sizes and substrates *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■ Cleaning after polishing, cleaning after CMP ■ Cleaning before film formation, cleaning before deposition ■ Cleaning before bonding, etc. *For more details, please refer to the PDF document or feel free to contact us.
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For inquiries about cleaning equipment, please contact Shimada Technology. We can assist you in improving yield and enhancing quality with our extensive cleaning technologies and diverse cleaning tools. Feel free to consult us about anything from repairing and modifying existing equipment to manufacturing and selling new devices. We will customize according to your needs. We also offer proposals for cleaning processes and conduct simple cleaning tests.