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  6. Manual spin cleaning device

Manual spin cleaning device

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MSW-300T

last updated:Oct 01, 2010

トービ
トービ
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Simple design manual spin cleaning device

Multipurpose Manual Device with Simple Design ==================================== <Specifications> Work Size... Φ2 inches to Φ6 inches Cleaning... Disk brush, standard equipment 1.1MS Options... High-pressure jet nozzle, chemical solution nozzle, etc. Power Supply... AC100v or 200v CDA... 0.5MPA or more Pure Water... 0.2MPA or more Others In a constant temperature water tank

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Manual spin cleaning device

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Multipurpose Manual Device with Simple Design ==================================== <Specifications> Work Size…Φ2 inches to Φ6 inches Cleaning…Disc brush, standard equipment 1.1MS Options…High-pressure jet nozzle, chemical solution nozzle, etc. Power Supply…AC100v or 200v CDA…0.5MPA or more Pure Water…0.2MPA or more Others In a constant temperature water tank

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Electronic Components and Semiconductors

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We design, manufacture, and sell various types of equipment for both testing and research purposes as well as production automatic devices, including various front-end (photoresist-related) devices and manual spin coaters (for Si, LCD glass, compounds, etc.). [Testing and Research Development, Production Related Equipment for Semiconductors and LCDs] Various cleaning machines (wet, dry), spin coaters, mask aligners, developing and etching equipment, various vacuum devices, probers, and drillers for film thickness measurement, etc.

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