Cleaning equipment for semiconductors without metal contamination! Equipped with a single-type steam injection supersonic nozzle.
"ASTE" is a vapor two-fluid cleaning device that can remove polymers after etching and foreign substances on wafers (replacing brush scrubbers) without metal contamination. It can simultaneously remove polymers and resists without using expensive amine-based stripping agents, leading to significant cost reductions. Since the raw material is "water," it is an environmentally friendly cleaning device. 【Features】 ■ Cost reduction ■ Reduction in the number of processes ■ Reduction of environmental impact *For more details, please feel free to contact us.
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basic information
【Basic Configuration】 ■ Steam generation device without metal contamination ■ Single-phase steam injection supersonic nozzle ■ Archimedes control system ■ EFEM (transport system) ■ Control system ■ Gas and water flow control system ■ Exhaust and drainage system 【Specifications】 ■ Number of chambers: 2 chambers ■ Wafer diameter: Compatible with 150, 200 mm ■ Number of cassettes: 2 cassettes ■ Utilities: DIW, N2, CDA ■ Steam pressure control range: 0.05-0.2 MPa ■ Main body dimensions: 1100 (W) × 1800 (D) × 2000 (H) *For more details, please feel free to contact us.
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Applications/Examples of results
【Target Applications】 ■ Polymer removal after etching ■ Removal of foreign substances on the wafer (replacement of brush scrubbers) *For more details, please feel free to contact us.
Company information
HUG Power Co., Ltd. contributes to the reduction of chemical usage and the lowering of environmental impact through the development, design, and sales of industrial cleaning equipment, centered around cutting-edge cleaning technology cultivated in the semiconductor industry. With the support of many people, we have finally established a path to commercialization since 2009, and shipments to mass production lines have begun. Currently, we are dedicated to fundamentally changing the cleaning processes that use many harmful chemicals, focusing on steam cleaning technology in our daily development efforts.
![Introducing in a video: [Supersonic Steam Cleaning Device]](https://image.mono.ipros.com/public/product/image/402/2000328665/IPROS3675120359509921715.png?w=280&h=280)
![Connectable even under residual pressure, large-diameter coupling 'TCH' [Fluid Connector]](https://image.mono.ipros.com/public/product/image/7f9/2000775468/IPROS91791548652271380266.png?w=280&h=280)
