Introducing processing examples in semiconductor engineering! Ultrasonic nozzles spray steam and liquid fluids at supersonic speeds for cleaning!
The steam two-fluid cleaning unit "SSC series" injects steam and liquid fluids at supersonic speeds from a supersonic injection nozzle, generating micro-cavitation on the surface of the target object for cleaning. By mixing liquid with steam, a two-fluid system is created, significantly enhancing cleaning power. To suppress metal contamination and the occurrence of fine foreign substances, a special coating is applied to the surface using specific materials, generating high-purity steam. This page includes comparative materials before and after cleaning in semiconductor processes (platinum residue). 【Features】 ■ No consumables like brushes, significantly reducing running costs ■ Only "pure water" is used ■ Substantially reduces the amount of chemical agents used ■ Greatly improves cleaning power ■ Also suitable for semiconductor cleaning *For details, please request materials or view the PDF data from the download.
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basic information
【Basic Configuration】 ○ Steam generation device without metal contamination ○ Supersonic steam injection nozzle ○ Communication with the cleaning machine body 【Steam Generation Device】 ○ Steam generation capacity: 2–100 kg/h * Sizes available to match the required steam amount ○ Utilities: DIW, N2, CDA, 200VAC or 100VAC ○ Steam pressure control range: 0.05-0.3 MPa ● For more details, please contact us or download the catalog.
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Applications/Examples of results
【Applications】 ○ Cleaning of solar cell substrates ○ Gold film removal in LED manufacturing ○ Cleaning of glass substrates, etc. ● For more details, please contact us or download the catalog.
Detailed information
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The above two fluid cleaning examples Cleaning examples
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Core technology
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Company information
HUG Power Co., Ltd. contributes to the reduction of chemical usage and the lowering of environmental impact through the development, design, and sales of industrial cleaning equipment, centered around cutting-edge cleaning technology cultivated in the semiconductor industry. With the support of many people, we have finally established a path to commercialization since 2009, and shipments to mass production lines have begun. Currently, we are dedicated to fundamentally changing the cleaning processes that use many harmful chemicals, focusing on steam cleaning technology in our daily development efforts.