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  6. Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

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last updated:Jul 03, 2024

HUGパワー
HUGパワー
  • Official site

Cleaning data for the removal of cutting powder from silicon substrates for solar cells is now available. Steam and liquid fluids are ejected at supersonic speeds from a supersonic injection nozzle for cleaning!

The steam two-fluid cleaning unit "SSC series" injects steam and liquid fluids at supersonic speeds from a supersonic injection nozzle, generating micro-cavitation on the surface of the target object for cleaning. By mixing liquid with steam, a two-fluid system is created, significantly enhancing cleaning power. To suppress metal contamination and the occurrence of fine foreign substances, a special coating is applied to the surface using specific materials, generating high-purity steam. This page contains data materials related to the removal treatment of cutting powder from silicon substrates for solar cells. 【Features】 ■ No consumables like brushes, significantly reducing running costs ■ Only "pure water" is used ■ Significantly reduces the amount of chemical agents used ■ Greatly improves cleaning power ■ Also used for semiconductor cleaning *For details, please request materials or view the PDF data from the download section.

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キャプチャ.JPG

Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

キャプチャ.JPG
キャプチャ.JPG
  • Related Link - https://hugpower.co.jp/

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basic information

【Basic Configuration】 ○ Steam generation device without metal contamination ○ Supersonic steam injection nozzle ○ Communication with the cleaning machine body 【Steam Generation Device】 ○ Steam generation capacity: 2–100 kg/h  ※ Sizes available to match the required steam amount ○ Utilities: DIW, N2, CDA, 200VAC or 100VAC ○ Steam pressure control range: 0.05-0.3 MPa ● For more details, please contact us or download the catalog.

Price information

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Applications/Examples of results

【Applications】 ○ Cleaning of solar cell substrates ○ Gold film removal in LED manufacturing ○ Semiconductor manufacturing processes ○ Cleaning of glass substrates, etc. ○ Removal of foreign substances and polymers ○ Removal of oils, fingerprints, etc. ○ Applications in medicine ○ Applications in beauty ● For more details, please contact us or download the catalog.

Detailed information

  • キャプチャ.JPG

    Above two fluid cleaning examples Cleaning examples

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    Core technology

catalog(6)

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Steam Two-Fluid Cleaning Unit "SSC Series"

Steam Two-Fluid Cleaning Unit "SSC Series"

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Case Study (Platinum Residue Cleaning) Steam Two-Fluid Cleaning Unit "SSC Series"

Case Study (Platinum Residue Cleaning) Steam Two-Fluid Cleaning Unit "SSC Series"

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Case Study (Regist Membrane Permeation) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Regist Membrane Permeation) Steam Two-Fluid Cleaning Unit SSC Series

TECHNICAL
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Case Study (Beer Hall Cleaning) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Beer Hall Cleaning) Steam Two-Fluid Cleaning Unit SSC Series

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Case Study (Contact Angle Measurement) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Contact Angle Measurement) Steam Two-Fluid Cleaning Unit SSC Series

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Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

TECHNICAL
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Company information

HUGパワー

HUGパワー

Electronic Components and Semiconductors

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HUG Power Co., Ltd. contributes to the reduction of chemical usage and the lowering of environmental impact through the development, design, and sales of industrial cleaning equipment, centered around cutting-edge cleaning technology cultivated in the semiconductor industry. With the support of many people, we have finally established a path to commercialization since 2009, and shipments to mass production lines have begun. Currently, we are dedicated to fundamentally changing the cleaning processes that use many harmful chemicals, focusing on steam cleaning technology in our daily development efforts.

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