NF3 maximum flow rate 8 slm, improved process performance and lifespan with unique PEO plasma block design!
"Paragon (R)" has achieved more suitable data transfer and control for next-generation nano process development and manufacturing, based on the characteristics of the MKS low magnetic field toroidal plasma source with a proven track record in mass production. It supports CVD and ALD/ALE process chamber cleaning, achieving high analytical efficiency (>98%) even under conditions of 8 slm NF gas flow and a maximum pressure of 10 Torr. 【Features】 ■ Maximum NF flow rate of 8 slm, compact design reduces cleaning time ■ Unique plasma block design with PEO coating improves process performance and lifespan ■ RoHS compliant, CE, S2, F47 *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications】 ■Process Gas Supply & Exhaust Gas supply connection KF40: Exhaust connection KF50 ■Gas Contact Materials PEO coating, 6061-T6 aluminum, Chemraz (R), alumina ■Control Interface EtherCAT and Analog I/O D-sub 25 pin *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company is a global leading company that provides the latest technologies in manufacturing processes for growth industries, including thin film applications such as semiconductor devices, FPD, OLED, solar cells, data storage, and coatings, as well as industrial applications such as medical devices, energy, environmental monitoring, and biopharmaceuticals. We offer worldwide support from service centers located around the globe.