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  6. High-purity alumina-based polishing material 'WA' suitable for various applications.

High-purity alumina-based polishing material 'WA' suitable for various applications.

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last updated:Jan 22, 2019

フジミインコーポレーテッド
フジミインコーポレーテッド
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For precision wrapping, blasting processing, materials for ultra-finish precision grinding wheels, and materials for polishing tapes! Abrasives capable of advanced surface processing.

"WA" is a representative precision processing micro-powder made from white alumina, used for a wide range of applications. It is produced by finely grinding and granulating fused alumina, and consists of high-purity alumina with an Al2O3 purity of 96.0% or higher, composed of α-type corundum crystals. It has a hardness second only to silicon carbide, maintains a sharp particle size distribution and stable particle shape, enabling advanced surface processing. 【Features】 ■ Exhibits excellent performance as a material for ultra-finish precision grinding wheels, ultra-finish abrasive cloth, and polishing tapes for ultra-precision surface finishing. ■ Suitable for precision lapping of metals without tensile strength, glass, quartz, semiconductor crystals, etc. ■ Chemically inert and resistant to high temperatures. ■ Outstanding stability in reaction with organic substances. ■ Widely used as a high-grade filler material (filling material) such as epoxy resin insulators. *For more details, please refer to the PDF document or feel free to contact us.

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High-purity alumina-based polishing material 'WA' suitable for various applications.

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  • Related Link - http://www.fujimiinc.co.jp/
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フジミインコーポレーテッド

フジミインコーポレーテッド

Electronic Components and Semiconductors

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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.

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