Pricing set at about 1/3 of the conventional cost! Tabletop vacuum plasma device.

Organic matter removal and cleaning possible! A more stable process is achieved compared to types that treat with residual atmosphere without introducing gas.

Our vacuum plasma products are used in a wide range of research applications, including cleaning, etching, and thin film formation. The gas introduction type "YHS-G" supports multiple gas introductions and allows for flow rate adjustments and precise setting of processing conditions, making it a high-performance product utilized in both research and production environments. We have now added the "YHS-O" to our product lineup, which limits gas introduction to oxygen and has been newly developed by reviewing the functions and structure of the main unit. It is offered at approximately one-third the price of our conventional products, and we have also made it possible to shorten delivery times. Furthermore, it achieves a more stable process compared to types that treat using residual atmosphere without gas introduction. [Application Examples] ■ Removal and cleaning of organic materials → Dry cleaning of experimental tools and pre-treatment before adhesion ■ Surface activation and hydroxyl group addition → In the bio and medical fields, such as cell culture containers ■ Bonding without using adhesives for PDMS and glass → Fabrication of microchannels *Please contact us or download the catalog from the link below for more information.

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