Organic matter removal and cleaning possible! A more stable process is achieved compared to types that treat with residual atmosphere without introducing gas.
Our vacuum plasma products are used in a wide range of research applications, including cleaning, etching, and thin film formation. The gas introduction type "YHS-G" supports multiple gas introductions and allows for flow rate adjustments and precise setting of processing conditions, making it a high-performance product utilized in both research and production environments. We have now added the "YHS-O" to our product lineup, which limits gas introduction to oxygen and has been newly developed by reviewing the functions and structure of the main unit. It is offered at approximately one-third the price of our conventional products, and we have also made it possible to shorten delivery times. Furthermore, it achieves a more stable process compared to types that treat using residual atmosphere without gas introduction. [Application Examples] ■ Removal and cleaning of organic materials → Dry cleaning of experimental tools and pre-treatment before adhesion ■ Surface activation and hydroxyl group addition → In the bio and medical fields, such as cell culture containers ■ Bonding without using adhesives for PDMS and glass → Fabrication of microchannels *Please contact us or download the catalog from the link below for more information.
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■Specifications Model: YHS-O (Note: O = O) External Dimensions: (W) 210 × (D) 230 mm × (H) 315 mm (excluding protrusions) Stage (Processing Electrode) Dimensions: Φ100 mm ・ Electrode Distance: 60 mm Weight: Approximately 6.0 kg Operating Gas: Standard: O₂ Exhaust Adjustment: Not adjustable Timer: Set Value: 0 to 9999 seconds (in 1-second increments) *For inquiries or to download the catalog, please see below.
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Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.