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  6. Hydrophilic, cleaning, adhesion enhancement 'Rotary Vacuum Plasma Device'

Hydrophilic, cleaning, adhesion enhancement 'Rotary Vacuum Plasma Device'

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YHS-DφS SAKIGAKE

last updated:Oct 03, 2014

魁半導体
魁半導体
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A rotary plasma device that can simultaneously process the surface modification (hydrophilicity, cleaning, adhesion enhancement) of "powders and solid surfaces" in a dry manner! Contributing to new technology development and cost reduction.

A rotary vacuum plasma device that utilizes the high reactivity of plasma for various surface treatment applications such as "hydrophilization," "cleaning," and "adhesion enhancement" for a wide range of materials including "powders and solid surfaces"! Conventional plasma devices could not treat contact areas such as the bottom surface where the sample does not touch the plasma, requiring a flipping process. This product allows for uniform plasma treatment across the entire surface of the sample by rotating the chamber. 【Features】 - Equipped with a rotating chamber for bulk processing of the entire surface. - Reduced processing time and cost savings through bulk treatment! - Even treatment of contact areas between samples without inconsistencies. - Surface modification for powders and small samples! Birth of a new technology. - Easy operability with detachable chamber, angle adjustment, rotation speed adjustment, and power adjustment, etc. 【Applications】 - Strengthening adhesion for various resin molded products such as O-rings. - Uniform surface modification for medical needles and tubes. - General applications for enhancing hydrophilicity and dispersibility of various powders. - Strengthening coating adhesion for fine particles such as capacitors, etc. We offer free demo processing.

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Hydrophilic, cleaning, adhesion enhancement 'Rotary Vacuum Plasma Device'

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  • Related Link - http://sakigakes.co.jp/plasma_YHS-DFS.html

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basic information

Domestic manufacturer of plasma devices "Sakai Semiconductor" Established in 2002 as a venture company originating from Kyoto Institute of Technology. Recipient of the "Kansai Front Runner Award" and the "Small and Medium Enterprises Excellent New Technology and New Product Award." Our in-house engineers respond to various needs. This product was developed in cooperation with the Ministry of Education, Culture, Sports, Science and Technology's support project "Kyoto Environmental Nanocluster," leading to its commercialization. 【Features】 Equipped with a rotating chamber, enabling processing of the entire surface of samples. Can also process powders and pellets. 【Specifications】 Functions: Pressure adjustment, power adjustment, rotation speed adjustment, discharge timer, detachable chamber, chamber precision adjustment, includes vacuum pump. Power supply: AC100V 50/60Hz Size: Main unit W720×D450×H450 Chamber φ210×H200 【Options available】 - Chamber size modification - RF type compatibility - Touch panel operation Our engineers handle everything from design to manufacturing. Dedicated personnel will sincerely respond to various requests from customers. Please feel free to consult us for any other inquiries.

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Applications/Examples of results

Resin molded products such as capacitors and O-rings We have developed products to meet the demand for surface hydrophilization of various powders. 【Applications】 - Cleaning / Removal of organic substances / Surface modification / Improvement of hydrophilicity / Enhancement of adhesion effects / Pre-treatment for printing and painting / Cell culture 【Applications】 - Strengthening adhesion for various resin molded products such as O-rings - Uniform surface modification on medical needles and tubes is possible. - General applications to enhance hydrophilicity and dispersibility of various powders Carbon powders used in conductive material development, carbon powders used in lithium-ion batteries, powders used in UV-cut creams - Strengthening coating adhesion for fine particles such as capacitors, etc. ...

Detailed information

  • DOS_siryou_01.jpg

    What is a rotating chamber!? A cylindrical electrode that can rotate is installed inside the chamber. High frequency is applied to the electrode in the center, which faces the cylindrical electrode, causing discharge. The workpiece can roll inside the rotating chamber, allowing for simultaneous processing of both sides.

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Company information

魁半導体

魁半導体

Educational and Research Institutions

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KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.

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