Material does not suffer thermal damage! Multiphoton excitation photolithography device using femtosecond laser.
The "MPF-330" is a multiphoton excitation photolithography device that uses femtosecond lasers. By using ultra-short pulse laser light in the range of 750 to 900 nm as the excitation source, it enables two-photon excitation of materials that have absorption in the ultraviolet to visible range. It offers higher spatial resolution than conventional photolithography using high-power lasers, allowing for nanoscale photolithography. 【Features】 ■ Multiphoton excitation photolithography device using femtosecond lasers ■ Enables two-photon excitation of materials with absorption in the ultraviolet to visible range ■ Materials do not suffer thermal damage ■ Capable of three-dimensional processing only internally ■ Achieves processing resolution beyond the diffraction limit *For more details, please refer to the PDF document or feel free to contact us.
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【Main Components】 ■ Laser introduction optical system ■ Spatial filter (confocal optical system) ■ Semiconductor laser for laser irradiation positioning ■ Infrared objective lens (Olympus X100, NA=0.8) * For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Our company is an optical equipment manufacturer that divides "light" into wavelengths ranging from ultraviolet to infrared, discovering and applying the interactions between each wavelength and molecules or atoms. We develop and prototype one-of-a-kind experimental devices to support advanced research by researchers at universities and other institutions. We respond to special needs with advanced optical technology.