Multiphoton Excitation Light Shaping Device 'MPF-330'

Material does not suffer thermal damage! Multiphoton excitation photolithography device using femtosecond laser.

The "MPF-330" is a multiphoton excitation photolithography device that uses femtosecond lasers. By using ultra-short pulse laser light in the range of 750 to 900 nm as the excitation source, it enables two-photon excitation of materials that have absorption in the ultraviolet to visible range. It offers higher spatial resolution than conventional photolithography using high-power lasers, allowing for nanoscale photolithography. 【Features】 ■ Multiphoton excitation photolithography device using femtosecond lasers ■ Enables two-photon excitation of materials with absorption in the ultraviolet to visible range ■ Materials do not suffer thermal damage ■ Capable of three-dimensional processing only internally ■ Achieves processing resolution beyond the diffraction limit *For more details, please refer to the PDF document or feel free to contact us.

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