High-reliability automatic scrub cleaning device for mass production sites
■ Optimized for mass production sites as "post-CMP and post-polishing cleaning," "incoming cleaning," and "final cleaning" ■ Capable of handling "resist removal" adhered during mask contact exposure ■ Proven performance with a 2-chamber configuration supporting 1.8 minutes per sheet ■ Options available for "inversion function," "brush pressure setting function," "CO2 ionizer," etc. ■ High-pressure jet and DIW two-fluid systems address bevel area contamination ■ Basic concept is contamination-free on the backside ◎ Vacuum chucks are generally not used due to contamination at the contact area ◎ Backside rinse function is standardly equipped. * For more details, please download the PDF document or feel free to contact us. * Please also refer to the catalog for similar models of "photo mask cleaning machines." Wafer, batch-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, semiconductor, resist stripping equipment, megasonic, substrate cleaning equipment, cleaning equipment, resist, photoresist, photolithography process, silicon, scrub cleaning equipment, scrub cleaning, wafer cleaning equipment, wafer cleaning machines, transport equipment.
Inquire About This Product
basic information
*For more details, please download the PDF document or feel free to contact us. *Please also refer to the catalog for similar models of the "Photo Mask Cleaning Machine."
Price range
Delivery Time
Applications/Examples of results
*For more details, please download the PDF document or feel free to contact us. *Please also refer to the catalog for similar models of the "Photo Mask Cleaning Machine."
catalog（2）
Download All Catalogs
Company information
* Under a team of experts well-versed in the manufacturing processes of various devices, we engage in consistent in-house activities that include the custom development, manufacturing, and sales of distinctive wet processing equipment tailored to meet the diverse needs of our clients, backed by years of accumulated know-how since our establishment, as well as after-sales support. * We manufacture and sell optimal system equipment while proposing processes that align with our clients' needs. * Our company is well-acquainted with various equipment forms such as batch (wet stations) and sheet (conveyor, spin), and we have numerous achievements; however, we particularly stand out with our Spin sheet-type equipment. * With the establishment of "patents" and "trademarks," we ensure that our products, such as the "Spin Dip Processor" and "UDS Processor," which possess a wide variety of unique features, cannot be easily replicated by others, attracting worldwide attention.