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  6. CLEALITE Series for Metal and Metal Oxide Polishing Slurry

CLEALITE Series for Metal and Metal Oxide Polishing Slurry

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last updated:Jun 03, 2019

フジミインコーポレーテッド
フジミインコーポレーテッド
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A polishing material that efficiently removes machining marks and molding marks, achieving a uniform smooth surface.

The "CLEALITE Series" is a polishing material designed to smooth the surfaces of various metals, sapphire, and aluminum anodized films, among other metal oxides. It is suitable for removing processing marks, smoothing, enhancing gloss, and improving texture on general industrial parts, decorative items, LED support substrates, and sapphire cover glass surfaces. 【Features】 - Uses high-performance alumina abrasive particles - Excellent uniformity in abrasive particle size, resulting in a defect-free uniform surface - Superior cleanability, minimizing negative impacts on subsequent processes - Designed to smooth metal oxide surfaces - Efficiently removes machining marks and molding marks, allowing for a uniform smooth surface *For more details, please refer to the PDF document or feel free to contact us.

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CLEALITE Series for Metal and Metal Oxide Polishing Slurry

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2019-05-28_09h39_24.png
  • Related Link - http://www.fujimiinc.co.jp/
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【Lineup】 ■CLEALITE 10 ■CLEALITE 51 ■CLEALITE 100 ■CLEALITE 35 ■CLEALITE 37 *For more details, please refer to the PDF document or feel free to contact us.

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Polishing slurry for metals and metal oxides "CLEALITE Series"

Polishing slurry for metals and metal oxides "CLEALITE Series"

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フジミインコーポレーテッド

フジミインコーポレーテッド

Electronic Components and Semiconductors

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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.

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