Film formation is possible on a flat sample with a height of 1.5m! Inline sputtering equipment suitable for mass production.
We would like to introduce our "Inline Coating System (Sputter)." This inline sputtering device is suitable for mass production. It can form films on flat samples up to 1.5m in height. It can be used for metal films, ceramic films, flat panel displays, and more. 【Features】 ■ Maximum substrate size: <3m(L) x 1.5m(H) ■ Uniformity: within ±5% ■ 90° vertical transport system ■ Number of chambers can be selected as needed *For more details, please feel free to contact us.
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【Applications】 ■Metal film ■Ceramic film ■Flat panel display ■Solar panel *For more details, please feel free to contact us.
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Our development technology has obtained international patents and plays a significant role in society. The super DLC (hydrogen-free ta-C film) produced by the FCVA method is formed through a completely different process compared to DLC films generated by existing PVD and CVD methods. Additionally, there is a composite metal film called "Micc film" that excels in release properties between metals and plastics. Coating films produced by the FCVA method are currently being rapidly adopted in fields such as the hard disk industry, precision machinery industry, and semiconductor industry, and future expansion into the automotive industry, nanoimprint industry, and biomaterials field is anticipated.
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