Removes particles from as small as 0.1μm! For cleaning semiconductor wafers and more.
This product is a high-frequency ultrasonic cleaning system that removes dust from fine uneven surfaces using ultrasonic waves. It can be used for cleaning semiconductor wafers, masks, and more. We offer a lineup of nozzle injection type, immersion type, and other cleaning processing systems. 【Features】 ■ Removes dust from fine uneven surfaces using ultrasonic waves ■ Equipped with transducers ranging from 400 kHz to 5 MHz ■ Removes particles as small as 0.1 μm ■ Offers a lineup including nozzle injection type and immersion type *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Examples of Cleaning Targets】 ■ Semiconductor wafers ■ Masks ■ LCDs ■ Substrates ■ MEMS ■ Solar-related ■ Microstructure components *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Company information
Koshin Electric Industry was founded in 1948 with the aim of natural measurement business. Since then, we have developed new products that are in line with the times through innovative technology and exceptional imagination, evolving into comprehensive observation systems that encompass sensing, transmission, and data processing in the fields of meteorology, hydrology, and geology, thereby contributing to society. The spirit cultivated through this business is the desire of all employees to "pass on a beautiful Earth to future generations," which has become the company culture.
