List of Ultrasonic Cleaner products
- classification：Ultrasonic Cleaner
1～45 item / All 530 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
We can accommodate high resistance over 10,000 ohms, with diameters ranging from approximately 30 mm to 8 inches, and we also offer thinning and chip processing arrangements!
- Other semiconductors
- Processing Contract
- Wafer
Are you making this mistake while draining water from your work?
- Ultrasonic Cleaner
No need for water washing!! Air blow cleaning removes stubborn dirt and attached dust with just air.
- Ultrasonic Cleaner
Are you making this mistake while draining water from your work?
- Ultrasonic Cleaner
Are you making this mistake when draining water from your work?
- Ultrasonic Cleaner
Are you making this mistake while draining water from the work?
[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.
Are you making this mistake with the work's drainage?
- Ultrasonic Cleaner
If you see this, you'll understand everything! I created a PR flyer.
100% water removal with air blow! No water droplets left on the workpiece! We have summarized everything about the patented complete drying air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Can it really remove 100% of the water?" "Why is it so effective at removing water?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download it and take a look!
No need for water washing!! Air blow cleaning with just air, from stubborn dirt to attached dust.
- Ultrasonic Cleaner
Just by looking at this, you'll understand everything! We created a PR flyer (dust removal version).
Thoroughly remove dust from workpieces with air blow! We have summarized everything about the patented complete dust removal air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Why can it remove dust so effectively?" "How can it remove dust even from complex-shaped workpieces?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download and take a look.
A new standard for high-efficiency fluorine cleaning born from the "voices" of the field.
- Ultrasonic Cleaner
Based on our years of experience and proven track record, we will contribute to reducing your running costs.
- Ultrasonic Cleaner
Technical explanation of the mechanism and benefits of ultrasonic cleaning with a heating heater!
- Ultrasonic Cleaner
Thorough removal of fine contaminants from wafers. High-quality cleaning achieved by Sonosys.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Photomask
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
For precise cleaning of prisms. Sonosys ultrasonic cleaning device.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Photomask
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
Next-generation megasonic technology can instantly clear wafers up to 300mm.
- Photomask
- Other semiconductor manufacturing equipment
- Ultrasonic Cleaner
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
Surface cleaning for MEMS device manufacturing with Sonosys ultrasonic cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
Precision cleaning of optical lenses with Sonosys ultrasonic cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
Ultrasonic cleaning by Sonosys for slurry removal in CMP engineering.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
Announcement of the product page launch for the SONOSYS Megasonic Cleaning Nozzle System | Precision Cleaning for Semiconductors and MEMS
We are pleased to announce that Tick Corporation has launched a product introduction page for the SONOSYS megasonic cleaning nozzle system. The megasonic cleaning technology from SONOSYS utilizes high-frequency energy ranging from 600 kHz to 9 MHz to precisely remove fine particles while minimizing damage to microstructures such as semiconductor wafers, photomasks, and MEMS. The new page features the characteristics of single, double, and triple nozzles, as well as applications for semiconductors, MEMS, optical components, and LCD/FPD substrates. If you are considering fine particle removal, precision cleaning using ultra-pure water (DI Water), or megasonic cleaning at frequencies such as 600 kHz or 1 MHz, please take a look.
I will provide a detailed explanation on how to prevent oil contamination using ultrasonic cleaning!
- Ultrasonic Cleaner
A detailed explanation of that mechanism and Daiko's implementation solutions!
- Ultrasonic Cleaner
A non-contact laser Doppler vibrometer that pursues ease of use by confirming the laser irradiation position with an internal camera.
- Vibration Inspection
- Vibration Testing
- Ultrasonic Cleaner
Exhibiting at "Maintenance Resilience TOKYO 2026"
We will be exhibiting at "Maintenance Resilience TOKYO 2026" (the 50th Plant Maintenance Show), which will be held at Tokyo Big Sight from July 15 (Wednesday) to July 17 (Friday), 2026. Experience our latest measurement solutions, featuring the "Portable Vibration Meter VW-3100," which integrates the three essential elements of "listening," "measuring," and "judging" for on-site vibration measurement into one device. As a manufacturer of measuring instruments, Ono Sokki will leverage our long-standing expertise in sensing technology and signal processing to solve your vibration measurement challenges. Additionally, we will broadly propose measuring instruments, judgment devices, detectors, and sensors related to acoustics, vibration, rotation, speed, temperature, and voltage for predictive maintenance of production equipment and product inspection. 【Exhibited Products】 Portable vibration meter, acoustic vibration analysis system, FFT comparator, vibration comparator, sound level meter, accelerometer, laser in-plane speed meter, digital tachometer, rotation detector, digital handheld tachometer, wireless measurement system (temperature and voltage).
New standard model of ultrasonic cleaner equipped with communication functions to support daily management.
- Ultrasonic Cleaner
Industrial compact cleaning machine for manufacturing lines, equipment integration, and space-saving solutions.
- Ultrasonic Cleaner
A comprehensive catalog of ultrasonic equipment tailored to the needs of a wide range of industries, including semiconductors, metal processing, resin molding, and food sectors! Many products for rent...
- Cutter/Scissors
- Distance measuring device
- Ultrasonic Cleaner
We will introduce the role of ultrasonic cleaning, six tips and precautions for maximizing its effectiveness!
- Ultrasonic Cleaner
- Ultrasonic cleaner
- Bio-related products, cleaning agents, maintenance and consumables
We have added a page explaining the principles of ultrasonic cleaning, from the mechanism of frequency to equipment selection and operation.
In the manufacturing process of industrial components, foreign substances remaining on the surface of parts or in fine gaps can significantly affect the reliability and yield of the products. Ultrasonic cleaning is one method of precision cleaning that can physically address such invisible fine dirt. However, if the ultrasonic cleaning equipment is not properly set according to the material and shape of the workpiece, as well as the nature of the dirt, not only will sufficient effectiveness not be achieved, but there is also a risk of damaging the workpiece. In this column, we will explain the principles and mechanisms of ultrasonic cleaning, as well as key points for selecting equipment and constructing the cleaning process.
Is the occurrence of losses and deterioration in productivity caused by maintenance?
- Other cleaning machines
- Ultrasonic Cleaner
![[Case Study] Fully Automatic Ultras...](https://image.mono.ipros.com/public/product/image/86362/IPROS83576576417683450.png?w=280&h=280){kind=small}
We will introduce case studies of implementation in various fields such as pharmaceutical and food manufacturing equipment!
- Ultrasonic Cleaner
![[Case Study] Batch-Type Ultrasonic ...](https://image.mono.ipros.com/public/product/image/86362/IPROS12449846786541848095.png?w=280&h=280){kind=small}
Introducing an overflow tank to collect dirt floating in the cleaning tank!
- Ultrasonic Cleaner
![[Individual Specifications] Example...](https://image.mono.ipros.com/public/product/image/86362/IPROS5750567462809295714.png?w=280&h=280){kind=small}
Capable of accommodating a wide range of custom specifications, from fully automatic to tabletop models!
- Ultrasonic Cleaner
![[Individual Specifications] Example...](https://image.mono.ipros.com/public/product/image/86362/IPROS6075037753639621974.png?w=280&h=280){kind=small}
We have a track record of diverse custom specifications tailored to meet customer needs!
- Ultrasonic Cleaner
You can choose the appropriate frequency according to the items being cleaned and the type of dirt!
- Ultrasonic Cleaner
We introduce a product that achieves uniform cleaning through an independent position vibration method!
- Ultrasonic Cleaner
Introducing ultrasonic cleaning to remove dirt from complex structures that cannot be removed by hand!
- Ultrasonic Cleaner
Standard equipped with a remote connector that allows ON/OFF control of ultrasonic cleaning via signals from external devices!
- Ultrasonic Cleaner
Three types of frequencies available to choose from according to your needs! Equipped with a leakage circuit breaker.
- Ultrasonic Cleaner
Compact and portable type! Also equipped with remote control functionality.
- Ultrasonic Cleaner
Introducing optional items that are only available when ordered together with an ultrasonic cleaner!
- Ultrasonic Cleaner
A wide variety of sizes available for cleaning baskets, cleaning cages, and drain trays!
- Ultrasonic Cleaner
Here are some examples of standard equipment for large washing machines!
- Ultrasonic Cleaner
Since the type designation has already been obtained, there is no need to apply for high-frequency utilization equipment!
- Ultrasonic Cleaner
Introducing a product that enhances cleaning effectiveness during degreasing thanks to its heating function!
- Ultrasonic Cleaner
Easier loading and unloading of cleaning items, reducing the burden on workers! Equipped with safety features such as an emergency stop switch.
- Ultrasonic Cleaner
Introducing a large cleaning machine with an added showering function for the cleaning process!
- Ultrasonic Cleaner
Equipped with automatic driving mode and manual driving mode! Settings such as skipping processes are also possible.
- Ultrasonic Cleaner
Introducing a variety of washing machines, including those with overflow features and deep tanks!
- Ultrasonic Cleaner
Equipped with a heating function to enhance the degreasing cleaning effect! Includes various safety features such as temperature overheat prevention.
- Ultrasonic Cleaner