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  6. Ultrasonic Megasonic Cleaning Equipment for Semiconductor Wafers

Ultrasonic Megasonic Cleaning Equipment for Semiconductor Wafers

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Sonosys

last updated:May 25, 2026

ティックコーポレーション 本社
ティックコーポレーション 本社
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Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.

In the semiconductor industry, particularly in wafer manufacturing, the removal of fine foreign substances and residues is a critical issue that affects product quality. Even slight contamination on the wafer surface can lead to decreased device performance and lower yields. Sonosys's ultrasonic megasonic cleaning equipment addresses these challenges by achieving high cleaning power and uniform cleaning, contributing to quality improvement in wafer manufacturing. 【Usage Scenarios】 - Removal of foreign substances in the wafer manufacturing process - Cleaning of precision parts - Rinsing process after chemical cleaning 【Benefits of Implementation】 - Reduction in cleaning time - Improvement in cleaning quality - Enhancement of yield

    Ultrasonic OscillatorUltrasonic CleanerUltrasonic cleaner
ソノシス社製超音波洗浄スプレーノズル(枚葉洗浄).jpeg

Ultrasonic Megasonic Cleaning Equipment for Semiconductor Wafers

ソノシス社製超音波洗浄スプレーノズル(枚葉洗浄).jpeg
ソノシス社製超音波洗浄スプレーノズル(枚葉洗浄).jpeg Triple-nozzle-ecf5619c.jpg 超音波洗浄装置(バス・タンク式).jpeg Zerstäuber-Demo.jpg
  • What is the Megasonic cleaning device manufactured by Sonosis?
  • Special site - Product/service details - https://pr.mono.ipros.com/ticjapan/product/

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【Features】 ≪Ultra-Precision High-Frequency Megasonic Cleaning Spray Nozzle≫ - Diverse cleaning needs addressed through combinations of single, dual, and triple channel nozzles and frequencies - Megasonic immersion-type transducer operating from 400kHz to 9MHz ≪Ultra-Precision High-Frequency Megasonic Immersion Cleaning System≫ - Stainless steel or plastic transducers - Compatible with 4", 6", and 8" substrate sizes - Improved cost-effectiveness through bath-tank cleaning 【Our Strengths】 Tick Corporation focuses on providing products that meet our customers' needs. With years of experience and a wide range of product offerings, we propose optimal cleaning solutions.

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Applications/Examples of results

Single Wafer Cleaning Systems Applications • Non-contact cleaning of single substrates • High-precision particle removal • Megasonic cleaning using pure water as the medium • High-purity cleaning of semiconductor and optical components Examples • Introduced as custom cleaning equipment with single, dual, and triple nozzle configurations to semiconductor manufacturers Megasonic Cleaning Nozzles Applications • Single wafer cleaning • Photomask cleaning • Non-contact cleaning of MEMS and microstructures • Lift-off process • Improved chemical cleaning efficiency in semiconductor front-end processes • Energy-saving in wet bench processes (reduction of chemicals and electricity) Examples • Adopted worldwide as semiconductor front-end cleaning equipment using high-frequency megasonics from 400kHz to 9MHz • Used by MEMS manufacturers as a cleaning solution that minimizes damage to fine micro and nano structures

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Ultrasonic cleaning spray nozzle (single) 1~5MHz

Ultrasonic cleaning spray nozzle (single) 1~5MHz

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Ultrasonic cleaning spray nozzle single (600kHz)

Ultrasonic cleaning spray nozzle single (600kHz)

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Ultrasonic cleaning spray nozzle Duel (type with 2 nozzles included)

Ultrasonic cleaning spray nozzle Duel (type with 2 nozzles included)

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Ultrasonic cleaning device (bath/tank type cleaning) 4-inch substrate generator (made of PVDF)

Ultrasonic cleaning device (bath/tank type cleaning) 4-inch substrate generator (made of PVDF)

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Ultrasonic cleaning device (bath/tank type cleaning) 6-inch substrate generator (made of PVDF)

Ultrasonic cleaning device (bath/tank type cleaning) 6-inch substrate generator (made of PVDF)

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Ultrasonic cleaning device (bath/tank type cleaning) 4-inch substrate generator (made of stainless steel)

Ultrasonic cleaning device (bath/tank type cleaning) 4-inch substrate generator (made of stainless steel)

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Ultrasonic cleaning device (bath/tank type cleaning) 6-inch substrate generator (made of stainless steel)

Ultrasonic cleaning device (bath/tank type cleaning) 6-inch substrate generator (made of stainless steel)

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Lechler Sonosys (Case Study) Spray Nozzles and Ultrasonic Spray Nozzles for Semiconductor Equipment

Lechler Sonosys (Case Study) Spray Nozzles and Ultrasonic Spray Nozzles for Semiconductor Equipment

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[Sonosys] (Case Study) Ultrasonic Spray Nozzle Improvement of Non-Woven Fabric Coating Line

[Sonosys] (Case Study) Ultrasonic Spray Nozzle Improvement of Non-Woven Fabric Coating Line

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Sonosys Company Overview (Ultrasonic Cleaning Equipment)

Sonosys Company Overview (Ultrasonic Cleaning Equipment)

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[Sonosys] Sonosys Company Overview (Ultrasonic Cleaning Equipment) (Revised 2021)

[Sonosys] Sonosys Company Overview (Ultrasonic Cleaning Equipment) (Revised 2021)

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ティックコーポレーション

ティックコーポレーション 本社

Machine elements and parts

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Tick Corporation is committed to providing products that contribute to solving various issues faced by companies, such as improving production efficiency, enhancing cost efficiency, improving quality, and considering environmental conservation. We have been widely collecting product information from around the world and providing products that meet market needs. In the future, we will continue to develop and deliver products that contribute to rationalization and particularly to environmental conservation, which has become increasingly stringent in recent years. ◇◆Main Products◇◆ - Precision industrial spray nozzles - Agricultural spray nozzles - Air nozzles / Air knives - Special spray nozzles - Tank cleaning nozzles - Blowers - Ultrasonic spray nozzles (Nebulizers / Atomizers) - Ultrasonic cleaning devices - Air conveying devices - Ventilators - Plastic connectors - Cutting torches (nozzles for gas cutters) - Latex testers - In-house manufactured tubing pumps (dispensers) - Syringe pumps

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If you're having trouble draining water after ultrasonic cleaning, use air blow for complete drainage.
Scientific and Physics Equipment
If you're having trouble draining water after ultrasonic cleaning, use air blow for complete drainage.
バリューイノベーションジャパン
Ideal for drying workpieces after ultrasonic cleaning. Instant complete drying with air blow.
Scientific and Physics Equipment
Ideal for drying workpieces after ultrasonic cleaning. Instant complete drying with air blow.
バリューイノベーションジャパン

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