Due to the sheet-type design, the reproducibility of the process is high, and the amount of chemical solution used is minimal. This is a resist development device that meets the needs for quality improvement and process stability!
This is a sheet-type photoresist developing system. It can accommodate various developing processes such as paddle development and spray development (single fluid, dual fluid). We have numerous achievements with thin wafers and square substrates! Additionally, it can handle a wide range from thick film resist development to fine pattern development. Our product features sheet-type development, baking, and cooling functions (optional: full exposure unit). We offer a lineup tailored to production volume, from manual machines to fully automatic machines, and since we handle everything from design to manufacturing and sales in-house, we achieve low prices. We have a proven track record with a variety of chemicals, including TMAH (tetramethylammonium hydroxide), sodium carbonate, and choline aqueous solution. 【Features】 ■ Stable developing process! ■ Low price ■ Automatic wafer size recognition ■ Proven track record with various chemicals ■ Compact design tailored to specifications! ■ Equipment lineup according to production volume We have a permanent demonstration setup, so please consider a demo.
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basic information
【Main Specifications】 ■ Cassette Stage: 2 sets ■ Spin Development Unit: 2 sets ■ Wafer Size: Φ2" to Φ12" ■ Development Nozzle: 1 set/CUP ■ Rinse Nozzle: 1 set/CUP ■ Bake Unit: 4 sets (Max 200℃) ■ Cooling Unit: 2 sets ■ Centering Unit: 1 set ■ Equipment Size: (Example) 1400×1100×1800 (Φ4" main body) 400×900×1800 (Chemical Supply + Power Box) ■ Wafer Transport Robot: 1 set (Double Arm Clean Robot) Many other options available! *For more details, please feel free to contact us.
Price range
Delivery Time
※4 to 5 months (usually), but it may vary depending on the situation, so please feel free to contact us.
Applications/Examples of results
We have numerous achievements in the fields of power devices, SAW filters, LEDs, and LDs, among others.
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Company information
We specialize in the design, manufacturing, and sales of photoresist coating, exposure, and development equipment, as well as photolithography processes in general, including double-sided exposure devices. In particular, we possess high uniformity coating technology for substrates with uneven surfaces or V-grooves, as well as for square and irregularly shaped substrates. Furthermore, we have developed and are selling a peeling and lift-off device that prevents the occurrence of burrs and metal reattachment using high-pressure jet NMP. Additionally, we handle various coating devices such as polyimide, PBF, OCD, WAX, high-temperature baking devices, and spin dryer devices. We customize equipment according to customer specifications and budgets. We also sell various wafers and substrates.