Water-repellent coating with plasma treatment. Compatible with resin films through low-temperature processing. Development support through sample testing. Compact type plasma surface treatment device.
Plasma technology with a wealth of experience in etching and cleaning supports water-repellent coating. Water-repellent treatment for various substrates including resin films, glass, and metal thin films. Adaptable to hydrophilization and cleaning through process changes. Compact, affordable, and highly reliable, cooperating in process development through sample testing. A plasma surface treatment device with proven results and support.
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basic information
Surface treatments (water-repellent, hydrophilic, surface oxidation, cleaning) on a standard 250mm processing stage. Various functional plasma modes (RIE/DP), gas types (F-based, CH-based), and substrate temperatures (water-cooled/heated) can be selected according to the substrate and purpose. Actual substrate evaluation is possible through sample testing. Scaling up and continuous processing with the same concept equipment is also easy.
Price information
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Delivery Time
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Applications/Examples of results
Water-repellent treatment of resin film Water-repellent treatment of glass substrate Research and development of various surface treatments Plasma cleaning of mounting substrates
Line up（2）
| Model number | overview |
|---|---|
| Plasma Cleaning Device "POEM" | |
| Plasma Etching Device "EXAM" |
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Company information
Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.
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