Unitize raw material containers, valves, piping, heaters, etc.! Two types of raw material containers can be selected.
The "TF-ALD Series" is an ALD unit designed to accommodate sublimation materials, developed based on research results from the Advanced Fusion Area Innovation Creation Base Formation Program at Tohoku University. It features 4-channel temperature control and up to 2 high-durability high-speed valves. Full control is possible via serial communication or ETHERNET communication. We offer six types of units depending on the vapor pressure of the materials and the types of reaction gases. 【Features】 - Integration of material containers, valves, piping, heaters, etc. - 4-channel temperature control and up to 2 high-durability high-speed valves. - Full control via serial communication or ETHERNET communication. - Six types of units available based on the vapor pressure of the materials and types of reaction gases. - Two types of material containers (large: approximately 180ml, small: approximately 60ml) can be selected. *For more details, please refer to the PDF document or feel free to contact us.
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【Raw Material Units】 ■ Low Vapor Pressure Unit - Uses carrier gas for gas transport ■ Medium Vapor Pressure Unit - Simple single valve configuration - Employs high-speed valves operating at up to 10 Hz ■ High Vapor Pressure Unit - Installs a measuring bottle between valves - Controls supply amount based on the number of valve openings and closings *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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At Techno Fine Co., Ltd., we propose specifications, design, and manufacture equipment tailored to our customers' needs, including semiconductor manufacturing equipment such as vacuum deposition process devices, plasma-compatible substrate stages, and analytical instruments.
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