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Industrial Machinery
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テクノファイン

EstablishmentDecember 1995
number of employees5
addressMiyagi/Taihaku-ku, Sendai-shi/21 Monzen, Nagafukuro, Akiu Town
phone022-399-2360
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last updated:Aug 31, 2017
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Sublimation material compatible ALD system 'TFALD-201'

Detailed customization is possible! Uniform film formation on high aspect ratio three-dimensional structures.

The "TFALD-201" is a research and development ALD system compatible with sublimation materials. It supports the deposition of metal oxides, precious metals, and composite metal films. Additionally, you can select suitable gas supply units according to the pressure of various materials and reaction gases. Furthermore, the material unit and gas supply unit can be added or removed as needed. 【Features】 ■ Compatible with sublimation materials ■ For research and development ■ Supports the deposition of metal oxides, precious metals, and composite metal films ■ Uniform film deposition on high aspect ratio three-dimensional structures ■ Detailed customization is possible *For more details, please refer to the PDF document or feel free to contact us.

  • Other physicochemical equipment

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Sublimation Material Compatible ALD Unit "TF-ALD Series"

Unitize raw material containers, valves, piping, heaters, etc.! Two types of raw material containers can be selected.

The "TF-ALD Series" is an ALD unit designed to accommodate sublimation materials, developed based on research results from the Advanced Fusion Area Innovation Creation Base Formation Program at Tohoku University. It features 4-channel temperature control and up to 2 high-durability high-speed valves. Full control is possible via serial communication or ETHERNET communication. We offer six types of units depending on the vapor pressure of the materials and the types of reaction gases. 【Features】 - Integration of material containers, valves, piping, heaters, etc. - 4-channel temperature control and up to 2 high-durability high-speed valves. - Full control via serial communication or ETHERNET communication. - Six types of units available based on the vapor pressure of the materials and types of reaction gases. - Two types of material containers (large: approximately 180ml, small: approximately 60ml) can be selected. *For more details, please refer to the PDF document or feel free to contact us.

  • Other physicochemical equipment

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Fluororesin wafer cleaning carrier (horizontal)

Made of all-fluoropolymer suitable for a wide range of solvents.

A vertical wafer cleaning fixture applicable to various sizes from φ2 to φ8 inches. Made entirely of fluororesin (PTFE), it can be used with a wide range of solvents, regardless of acidity or alkalinity. Custom specifications are also available, including changes to work size, number of sets, and handle length.

  • Plastic utensils and containers

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Fluororesin wafer cleaning carrier (vertical placement)

Made of all-fluoropolymer suitable for a wide range of solvents.

A vertical wafer cleaning fixture applicable to various sizes from φ2 to φ8 inches. Made entirely of fluororesin (PTFE), it can be used with a wide range of solvents, regardless of whether they are acidic or alkaline. Custom specifications are also available, including changes in work size, number of sets, and handle length.

  • Stainless steel utensils and containers

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Tabletop spin dryer

Tabletop mountable circuit board dryer

Utilizing centrifugal force, we perform drying processes for substrate-shaped workpieces such as silicon wafers. It can be installed on a tabletop, and all models are powered by outlet supply, so no additional electrical work is required for installation. We offer a lineup of various sizes, from 20mm square substrates to 6-inch wafers.

  • Drying Equipment

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