We can also create wiring patterns for both sides of the glass and multilayer wiring, so please feel free to consult with us!
We offer a "glass through-hole processing service using sandblasting + wet etching methods." We accommodate thin to thick metal films such as ITO / Cr / Ti / Al / Au / Ag / Cu / Ni / Mo alloys. We can also create wiring patterns and multilayer wiring on both sides of the glass, so please feel free to consult with us. 【Substrate Details】 ■ Alkali-free glass ■ φ12 inches × 0.3 mm thick ■ Aperture diameter: φ150 μm ■ Pitch: 300 μm ■ Number of holes: 700,000 ■ Metal film: 8,000 Å *For more details, please refer to the PDF document or feel free to contact us.
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In 1983, we were established as a thin film metal patterning factory of Micron Technology Research Institute, focusing on LCD substrates and PDP substrates, and have been producing cutting-edge products using photolithography and etching technologies. In 2007, we became a separate company as Kiso Micro Co., Ltd., enhancing our commitment to challenge ourselves with more creative products and aiming to be a trusted company by our customers as a company that can create for the future. Please utilize our services from development to mass production.