It is a cermet thermal spray material with excellent balance of corrosion resistance, wear resistance, and toughness.
This is a WC/10wt%Co/4wt%Cr thermal spray material produced by the granulation-sintering method. By strictly controlling particle size and granule strength, it achieves spitting prevention and excellent adhesion efficiency, while obtaining a thermal spray coating with a superior balance of wear resistance, corrosion resistance, and toughness. W1004 has excellent wear resistance and wet wear characteristics (slurry erosion resistance), as well as outstanding cavitation erosion resistance. In terms of coating properties, it exhibits characteristics intermediate between 'SURPREX W12' and 'SURPREX W2007'. [Application Examples] Leveraging its high corrosion resistance, wear resistance, slurry erosion resistance, and cavitation erosion resistance, it is used in a wide range of fields such as steelmaking, papermaking, and hydraulic machinery. Application examples include: - Turbine blades - Water turbine blades - Pump components - Plungers - Papermaking coating rolls, etc. [Message] At Fujimi, we manufacture and sell many cermet materials in addition to W1004, and we can also prototype powders with adjusted WC particle size and composition according to customer requests. If you have any questions or requests, please feel free to contact us. *For product details, please refer to the catalog.
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【Examples of Use】 Utilizing high corrosion resistance, wear resistance, slurry erosion resistance, and cavitation erosion resistance, it is used in a wide range of fields such as steelmaking, papermaking, and hydraulic machinery. Application examples: - Turbine blades - Water turbine blades - Pump components - Plungers - Papermaking coating rolls, etc.
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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.