A high ion current helicon plasma ion source PVD module that achieves directional film formation and enables reactive sputtering.
HR-PVD Sputtering Module by AVP Technology - Achieves higher ionization efficiency compared to ICP sources using a remote plasma source with a helicon plasma ion source. - Excellent straightness from the inclined angle direction results in outstanding film thickness uniformity and step coverage. - Enables film formation while keeping the substrate at a low temperature through remote plasma. - Also achieves excellent results in target utilization efficiency. *For more details, please contact us.
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basic information
- Compatible with wafers up to 200mm. - It is also possible to install on used cluster tools by changing to AVP Technology's proprietary control system. Additionally, it can be used in conjunction with other PVD and etching modules. *For more details, please contact us.
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Applications/Examples of results
- Magnetic head - Thin film head - Thermal head - MEMS - Spintronics materials These are ideal for film formation applications of high magnetic materials and high dielectric materials.
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Company information
For semiconductor, electronic devices, and optical thin film manufacturing equipment, come to us. Our company was established in March 2016 with the aim of providing agency services for several overseas manufacturers with advanced technologies related to vacuum processes, as well as maintenance services for these devices. Our product lineup includes a wide range of equipment such as sputtering, high-density plasma sources and pulse power supplies, ion beam etching and milling, ion beam sputtering, neutral cluster ion beam process equipment, organic material sublimation purification and film deposition equipment, various filters for liquids, and cleaning brushes, among others.