Highly competitive costs! Capable of covering a wide range of fields, including optical surface acoustic wave filters.
Ice Moss Technology supplies thin-film SOI wafers with device layers of less than 1um. With over 20 years of experience in SOI manufacturing, Ice Moss can provide products of high quality similar to thick-film SOI used in RF applications. Ice Moss's thin-film SOI wafers cover a wide range, including silicon wafers and thermal oxide films, and can be used in fields such as optical engineering surface acoustic wave filters. 【Features】 ■ Capable of covering a wide range, including optical engineering surface acoustic wave filters, with silicon wafers and thermal oxide films. ■ Through process management based on Six Sigma statistical control methods, Ice Moss continuously improves while providing world-class product quality. ■ Competitive costs and flexible responses. *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Final Market】 ■Telecommunications ■General Consumers ■Power Supply ■Medical *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Applications】 ■ RF filters ■ Optoelectronics ■ Image detection ■ Wireless connections ■ Flexible hybrid electronics ■ RF MEMS *For more details, please refer to the PDF document or feel free to contact us.
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Our company was established in 2004 as a best-in-class supplier providing high-voltage power MOSFETs and MEMS technology processes that deliver high performance for power supplies, advanced technology base wafers, SOI (silicon on insulator), and bonded silicon substrates at a high cost-effectiveness. (Headquartered in the U.S., with manufacturing facilities in the U.K. and R&D in Tokyo) We have developed and realized high-voltage super junction MOSFETs with innovative deep trench etching MEMS structures through a simple and low-cost process. Please feel free to contact us if you have any inquiries.