Of course, RCA, development, etching, cleaning, stripping, lift-off, etc.! We have a wealth of experience in various process treatments.
The device achieves complete separation and reuse of chemical solutions, and is a manual Spin single-wafer processing device capable of handling the full process of chemical treatment ⇒ rinsing ⇒ drying in one spin. It significantly reduces footprint and costs, and is already patented. It can accommodate not only round substrates but also square-shaped substrates. It has a proven track record in various process treatments such as "RCA," "developing," "etching," "cleaning," "stripping," and "lift-off." 【Features】 ■ It is possible to consolidate various chemical treatment processes such as cleaning and etching into a single total system. ■ It can significantly reduce equipment purchase costs and footprint. ■ Since transfer between chambers is unnecessary, it reduces workpiece attachment and detachment, streamlining operations and preventing transport accidents, thereby improving transport reliability. *For more details, please refer to the PDF document or feel free to contact us. Wafer, single-wafer cleaning device, coating and developing device, substrate cleaning device, spin cleaning device, semiconductor manufacturing equipment, semiconductor, resist stripping device, megasonic, cleaning device, resist, photoresist, photolithography process, silicon, scrub cleaning device, scrub cleaning, wafer stripping device, wafer cleaning device, wafer cleaning machine.
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【Other Features】 - The lower section performs chemical treatment with a separation and reuse function, while the upper section primarily handles rinsing and drying processes. - Our original, patented "Isolation and Separation Function" prevents rinsing water in the upper section from falling into the chemical chamber in the lower section, allowing for the circulation and reuse of chemicals. - During rinsing/drying processes in the upper section, the chemical atmosphere in the lower section can be physically isolated, effectively suppressing particle contamination as well as the adhesion/absorption of chemical gases to the substrate, resulting in high-quality substrates. - Safety for humans and the environment is ensured, and contamination and corrosion of the equipment can be minimized. - As an application, it has been practically implemented to treat two chemically different liquids, such as SPM (acid) in the lower section and APM (alkaline) in the upper section, within a single chamber. - This significantly contributes to footprint and cost efficiency. *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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* Under a team of experts well-versed in the manufacturing processes of various devices, we engage in consistent in-house activities that include the custom development, manufacturing, and sales of distinctive wet processing equipment tailored to meet the diverse needs of our clients, backed by years of accumulated know-how since our establishment, as well as after-sales support. * We manufacture and sell optimal system equipment while proposing processes that align with our clients' needs. * Our company is well-acquainted with various equipment forms such as batch (wet stations) and sheet (conveyor, spin), and we have numerous achievements; however, we particularly stand out with our Spin sheet-type equipment. * With the establishment of "patents" and "trademarks," we ensure that our products, such as the "Spin Dip Processor" and "UDS Processor," which possess a wide variety of unique features, cannot be easily replicated by others, attracting worldwide attention.
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