Technical Data for Automatic Titration Device: Chloride Ions in Acidic Copper Plating Bath
Quantification of surfactants by titration
Automating quality control of the chloride ion concentration in the acidic copper plating bath used for Cu deposition on semiconductor wafers using a potentiometric automatic titration system.
Acid copper plating baths are mainly used for Cu film formation on semiconductor wafers. When a small amount of chloride is present, the film formation rate increases, and anode polarization is suppressed. However, if the concentration becomes too high, the quality of Cu film formation deteriorates, which is undesirable. Therefore, monitoring the concentration of chloride ions is extremely important for efficiently achieving high-quality Cu film formation. Plating bath, electroplating bath.
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basic information
By using an automatic titration device with a metronome to measure the chloride ion concentration in the acidic copper plating bath, quality control can be automated.
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The booklet is available for free download.
Detailed information
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OMNIS Titration System
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OMNIS Titration System
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Company information
Metrom AG, based in Herisau, Switzerland, is a leading company specializing in ion analysis with over 70 years of history. It provides products and services in more than 140 countries worldwide. Based on Swiss technology developed over many years, the equipment comes with a 3-year warranty.
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