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Vacuum solutions for coating processes

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last updated:Apr 01, 2022

エドワーズ
エドワーズ
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Edwards has extensive experience in many thin film processes, including vacuum deposition, sputtering, CVD, and plasma polymerization.

This catalog introduces vacuum solutions related to the coating process. The coating process involves depositing metals, inorganic compounds, and organic compounds to form thin films for various applications. Vacuum pumps are used to prevent contamination of impurities during the process, improve film formation speed, and for plasma generation applications. Edwards provides packaged solutions based on extensive knowledge of applications and processes derived from past installation achievements. *For more details, please refer to the PDF document or feel free to contact us.*

    Other pumpsPositive Displacement PumpVacuum pump
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Vacuum solutions for coating processes

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Applications/Examples of results

Vacuum deposition, sputtering, ion plating, CVD, plasma CVD, plasma polymerization.

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Vacuum solutions for coating processes

Vacuum solutions for coating processes

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エドワーズ

エドワーズ

Industrial Machinery

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Edwards is the world's largest manufacturer of vacuum pumps and exhaust gas treatment equipment (pollution control devices), founded in the UK in 1919. Our mission is to provide vacuum solutions that address our customers' challenges through a range of products and services based on vacuum technology. We are committed to product development, testing and evaluation, after-sales service, and employee training on a daily basis. With a global network and high technical capabilities, our service factories have stable repair capabilities, ensuring that customers in any region can use our products with confidence.

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