Not just a thin film! It can also form a thick film.
Generally, thin films are often deposited at the nano level, but our company also receives many requests for thick films. We receive inquiries ranging from 1 micron to several microns, and in some cases, even over 10 microns depending on the project. Of course, the specifics will vary depending on the substrate and the type of film to be applied, but please feel free to consult with us first! (We are also skilled in thin films, of course.) Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We accommodate various types of films, including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their laminated films. We have established a system to respond to a wide range of requests, from small-scale projects for prototypes, development, and research to medium-sized production projects. With a rich lineup of equipment ranging from small to large devices and over 35 years of proven results, we flexibly respond to our customers' needs!
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basic information
■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/Ni/Cr, Au/Pt/Ti, Au/Pd/Ti, Au/Cr, Cu/Cr, etc. Oxide Films: Al2O3, SiO2, TiO2, Cr2O3, ITO, MgO, NbO, Ta2O5, WO3, ZrO2, ZnO, etc. Nitride Films: AlN, BN, CrN, MoN, NbN, SiN, TaN, TiN, etc. Carbide Films: SiC, TiC, BC, etc. *Please consult us as this may vary depending on the equipment used. ■Maximum Usable Size: 800×1000mm *We have a wide range of equipment from small to large. ■Supported Substrates - Si Wafer - Glass - Film - Ceramics - Metal Materials - Others
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[Target Objects] A wide range including glass, ceramics, resin materials, metals, Si wafers, etc., and capable of handling three-dimensional objects as well.
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Company information
Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.
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