More than 50 types of thin film coatings available, even for just one piece! Ion plating developed from space development technology.
Ion plating is an advanced version of vacuum deposition. Similar to vacuum deposition, it involves evaporating (or sublimating) the material to be formed into a film in a vacuum and depositing it onto a substrate such as glass or silicon wafers. The characteristic of ion plating is that it passes the evaporated particles through plasma to give them a positive charge, and by applying a negative charge to the substrate side, it attracts the evaporated particles to deposit them on the substrate, thereby forming a thin film. It is possible to impart new functions to components and materials according to their applications. **Features of Ion Plating** - Stronger adhesion than vacuum deposition - Coating at low temperatures is possible (except for a few types of films) - Compatible with a wide range of film types - Diversity in deposition conditions can be achieved - Applicable to reactive films such as oxide films, nitride films, and carbide films - Better film coverage in shadow areas compared to vacuum deposition - Alloy films are possible
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■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/Ni/Cr, Au/Pt/Ti, Au/Pd/Ti, Au/Cr, Cu/Cr, etc. Oxide Films: Al2O3, SiO2, TiO2, Cr2O3, ITO, MgO, NbO, Ta2O5, WO3, ZrO2, ZnO, etc. Nitride Films: AlN, BN, CrN, MoN, NbN, SiN, TaN, TiN, etc. Carbide Films: SiC, TiC, BC, etc. ■Maximum Usable Size: 800×1000mm *We have a wide range of equipment from small to large. ■Compatible Substrates - Si Wafer - Glass - Film - Ceramics - Metal Materials - Others
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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.
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