We would like to introduce the etching equipment for ultra-low temperature environments that we handle.
We would like to introduce the "Takachi ICP Cryo," which we handle. It is used in etching processes that require higher anisotropy and selectivity. 【Features】 ■ Temperature range: -150℃ to +350℃ ■ Wafer size: 2" to 8" * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.
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*You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.
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*You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for over 50 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en
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