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  1. Home
  2. Electronic Components and Semiconductors
  3. プラズマ・サーモ・ジャパン
Electronic Components and Semiconductors
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プラズマ・サーモ・ジャパン

addressKanagawa/Nishi-ku, Yokohama-shi/4-4-2 Minatomirai, Yokohama Blue Avenue, 12th Floor
phone045-274-8089
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last updated:Jul 25, 2022
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  • Company information
  • Products/Services(33)
  • catalog(21)
  • news(13)

プラズマ・サーモ・ジャパン Company Profile

Comprehensive support from product development to mass production! Plasma technology that supports the semiconductor industry in the data era!

Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en

Business Activities

■In addition to etching, film deposition, and cutting equipment utilizing plasma technology, we sell ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, HDRF F.A.S.T.-ALD equipment. ■We provide customer service related to these devices.

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Products/Services (33)

Ion Assist Sputtering Deposition Equipment product image
Ion Assist Sputtering Deposition Equipment
Photo Mask Dry Etching Equipment for Research and Development Purposes product image
Photo Mask Dry Etching Equipment for Research and Development Purposes
MEMS Engineer Forum - Notice of Technical Exhibition product image
MEMS Engineer Forum - Notice of Technical Exhibition
Notice of Participation in "Semicon Japan 2024" and Seminar Hosting product image
Notice of Participation in "Semicon Japan 2024" and Seminar Hosting

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catalog(21)

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Shuttleline 300 Series

Shuttleline 300 Series

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Ion Beam Deposition Device

Ion Beam Deposition Device

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Ion Beam Etching Device

Ion Beam Etching Device

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Ion Beam Etching Device

Ion Beam Etching Device

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news(13)

image.png

"MEMS Engineer Forum 2025" - Announcement of Technical Exhibitions

  • SEMINAR_EVENT

We will be exhibiting at the technical exhibition corner of the "MEMS Engineer Forum 2025" to be held from April 16 to 17, 2025. <Exhibition Contents> 1. Introduction of low-temperature, low-damage etching and cleaning equipment using high-density radicals. Our patented HDRF technology eliminates yield issues in MEMS. 2. Introduction of processing technology (ion beam etching) essential for future high-frequency devices and high-speed optical modulation waveguide processing. Ion beam etching is optimal for processing multilayer structures, allowing for angle adjustment of the processing surface and roughness adjustment of sidewalls. 3. Introduction of plasma etching and film deposition equipment suitable for batch processing of compound semiconductors. Multiple wafers can be loaded onto a "shuttle" (wafer carrier) for batch processing. This equipment is suitable for small-scale production. We look forward to your visit.

Mar 18, 2025

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Notice of Participation in "Semicon Japan 2024" and Seminar Hosting

  • SEMINAR_EVENT

"Semicon Japan 2024" will be held from December 11 (Wednesday) to December 13 (Friday) from 10:00 to 17:00 at Tokyo Big Sight. Our booth number is 4032. We will be holding seminars at our booth according to the schedule below, so please come and visit us. ◇HDRF - Introduction of a new technology that can remove polymers and HDI resist at low temperatures using high-density radicals. ◇KOBUS FAST - Introduction of a new technology that enables ALD-like film deposition at CVD film deposition rates. ◇Schedule December 11: 10:30~10:50 HDRF 14:00~14:20 KOBUS FAST December 12: 10:30~10:50 KOBUS FAST 14:00-14:20 HDRF December 13: 10:30~10:50 HDRF 14:00~14:20 KOBUS FAST

Nov 13, 2024

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TFE Corporation's sputtering device - Down/Side sputter structure supports a wide range of applications.

  • PRODUCT

TFE-Thin Film Equipment Srl, based in Nabisco, in the suburbs of Milan, Italy, has been designing and manufacturing thin film deposition equipment for nearly 40 years, providing thin film deposition systems across various fields. For example, thin film deposition at low temperatures of around 50 degrees allows for the coating of plastic products, and the tray-type sample trays enable the formation of electrodes for piezoelectric elements of different sizes, as well as decorative coatings and protective film coatings for objects of varying shapes. These systems can be used for various applications, including medical products, sensors, and probe cards. Demonstrations are available, and customization is supported. From product launch to maintenance, Plasma Therm Japan will provide support in Japanese.

Oct 09, 2024

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Detailed information

Company name プラズマ・サーモ・ジャパン
Contact addresspostalcode 220-0012 Kanagawa/ Nishi-ku, Yokohama-shi/ 4-4-2 Minatomirai, Yokohama Blue Avenue, 12th FloorView on map TEL:045-274-8089 FAX:045-274-8006
Industry Electronic Components and Semiconductors
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