A must-see for those involved in the new development of photomasks! A dry etching device with a compact design that can process photomasks and wafers of various sizes.
We would like to introduce our "RIE Dry Etching Equipment for Photomasks." By adopting a "shuttle" as the carrier for photomasks, it is possible to process various sizes of photomasks simply by replacing the "shuttle," without the need to change the hard wafer. We offer both open load and load lock types, and with the load lock type, it is possible to etch MoSi, Cr, and Ta materials in a single chamber. 【Features】 ■ Compact design ■ Easy cleaning of the reactor interior through plasma cleaning ■ Use of liners to prevent contamination within the reactor chamber ■ Easy to remove due to the plug-in design *For more details, please download the PDF (English version) or feel free to contact us.
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【Other Features】 ■ Capable of processing photomasks, wafers, and coupons if they fit within a size of Φ360mm ■ Adopts a graphical user interface ■ Easy management of manufacturing process history and recipe changes, which can improve productivity *For more details, please download the PDF (English version) or feel free to contact us.
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【Purpose】 ■New development of photomasks ■New development of photomask materials *For more details, please download the PDF (English version) or feel free to contact us.
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Our company offers etching, film deposition, and cutting equipment utilizing plasma technology, as well as the sale of ICP, RIE, DSE, IBE, IBD, PECVD, HDPCVD, and HDRF F.A.S.T.-ALD equipment, along with customer service related to these devices. Plasma-Therm LLC, headquartered in Florida, USA, was established in 1974. Since its founding, it has been manufacturing and selling semiconductor manufacturing equipment utilizing plasma technology for 48 years. Please feel free to contact us for inquiries. ▼ Group company Corial official website https://corial.plasmatherm.com/en